Variability-aware TCAD based design-technology co-optimization platform for 7nm node nanowire and beyond

Abstract

In this work, a design-technology co-optimization (DTCO) platform for 7nm node nanowire and beyond is demonstrated for the first time. The platform extends from predictive TCAD simulations through compact model extraction to circuit simulation. The impact of different cross-section geometries, design of experiment, parasitic effects, global variation and local variation are accurately and efficiently examined to provide insights for variability-aware device/circuit co-optimization.