Micro-texture and physical properties of the cold-sprayed copper deposit

Y. Watanabe, Y. Ichikawa, I. Nonaka, H. Miura
{"title":"Micro-texture and physical properties of the cold-sprayed copper deposit","authors":"Y. Watanabe, Y. Ichikawa, I. Nonaka, H. Miura","doi":"10.1109/EMAP.2012.6507870","DOIUrl":null,"url":null,"abstract":"The cold spray (CS) method is a new deposition technique. In this technique, small solid particles impact and deposit on a substrate without melting. The deposition rate of the CS method is much higher than that of the other deposition processes. Expected applications of this technology are not only coating film production but also direct copper wiring technique for electronic products. This method also can be applied to patterning of thin films without photomasks. For example, an arbitrary geometry thin-film pattern can be formed on a substrate by scanning a spray nozzle. However, mechanical properties of the CS deposit and its micro-texture are found to be quite different from those of bulk copper. The previous researches showed that the CS deposit has high strength and indicates brittle-like fracture. The cold-sprayed copper deposit has a micro-texture which is stacked heavily deformed particles. The difference of the micro-texture between the cold-sprayed copper deposit and bulk copper is the main reason of the different mechanical properties. Thus, there is a possibility that the electrical properties of the cold-sprayed copper deposit are also different from bulk copper. In this study, both micro-texture and the electrical properties of the cold-sprayed copper deposit were measured by using SEM and EBSD technique and a four-point probe method. From the EBSD evaluation results, it was found that the average grain size in the deposited particles was much smaller than that of feed stock powder and bulk copper. The electrical resistivity of cold-sprayed copper deposit was much higher than that of bulk copper. The fine grain texture of the cold-sprayed copper deposit is one of the reasons for this high electrical resistivity.","PeriodicalId":182576,"journal":{"name":"2012 14th International Conference on Electronic Materials and Packaging (EMAP)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 14th International Conference on Electronic Materials and Packaging (EMAP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EMAP.2012.6507870","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

The cold spray (CS) method is a new deposition technique. In this technique, small solid particles impact and deposit on a substrate without melting. The deposition rate of the CS method is much higher than that of the other deposition processes. Expected applications of this technology are not only coating film production but also direct copper wiring technique for electronic products. This method also can be applied to patterning of thin films without photomasks. For example, an arbitrary geometry thin-film pattern can be formed on a substrate by scanning a spray nozzle. However, mechanical properties of the CS deposit and its micro-texture are found to be quite different from those of bulk copper. The previous researches showed that the CS deposit has high strength and indicates brittle-like fracture. The cold-sprayed copper deposit has a micro-texture which is stacked heavily deformed particles. The difference of the micro-texture between the cold-sprayed copper deposit and bulk copper is the main reason of the different mechanical properties. Thus, there is a possibility that the electrical properties of the cold-sprayed copper deposit are also different from bulk copper. In this study, both micro-texture and the electrical properties of the cold-sprayed copper deposit were measured by using SEM and EBSD technique and a four-point probe method. From the EBSD evaluation results, it was found that the average grain size in the deposited particles was much smaller than that of feed stock powder and bulk copper. The electrical resistivity of cold-sprayed copper deposit was much higher than that of bulk copper. The fine grain texture of the cold-sprayed copper deposit is one of the reasons for this high electrical resistivity.
冷喷涂铜镀层的显微组织和物理性能
冷喷涂(CS)法是一种新的沉积技术。在这种技术中,小的固体颗粒撞击并沉积在衬底上而不熔化。CS法的沉积速率远高于其他沉积工艺。该技术的预期应用范围不仅包括涂层生产,还包括电子产品的直接铜线技术。该方法也可应用于无掩膜薄膜的图像化。例如,可以通过扫描喷嘴在基板上形成任意几何形状的薄膜图案。然而,CS镀层的力学性能和显微组织与大块铜有很大的不同。前人的研究表明,CS沉积层具有较高的强度和脆性断裂特征。冷喷涂铜镀层具有由大量变形颗粒堆积而成的微观结构。冷喷涂铜镀层与块状铜镀层微观组织的差异是造成其力学性能差异的主要原因。因此,有可能冷喷涂铜镀层的电学性能也不同于大块铜。本研究采用扫描电镜(SEM)、EBSD技术和四点探针法对冷喷涂铜镀层的显微组织和电学性能进行了测量。从EBSD评价结果来看,沉积颗粒的平均晶粒尺寸远远小于原料粉和散装铜的晶粒尺寸。冷喷涂铜镀层的电阻率远高于体铜镀层。冷喷涂铜镀层的细晶粒结构是其电阻率高的原因之一。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信