A Complementary RF-LDMOS Architecture Compatible with 0.13μm CMOS Technology

N. Mohapatra, H. Ruecker, K. Ehwald, R. Sorge, R. Barth, P. Schley, D. Schmidt, H. Wulf
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引用次数: 12

Abstract

In this paper, we present a modular and reliable complementary RF LDMOS (laterally diffused MOS) architecture fully compatible with a 0.13 mum CMOS platform. We demonstrate BVDS*fT values up to 560 and 210 GHzV, respectively, for N- and PLDMOS transistors. A major advantage of the proposed process flow is that the drift region of N- and PLDMOS transistors can be independently optimized for different BVDSwithout affecting the VT
兼容0.13μm CMOS技术的互补RF-LDMOS架构
在本文中,我们提出了一个模块化和可靠的互补RF LDMOS(横向扩散MOS)架构,完全兼容0.13 μ m CMOS平台。我们证明了N-和PLDMOS晶体管的BVDS*fT值分别高达560和210 ghz。该工艺流程的一个主要优点是,N-和PLDMOS晶体管的漂移区域可以在不影响VT的情况下针对不同的bvds进行独立优化
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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