Xiaowu Zhang, Y. Andriani, M. C. Jong, L. Bu, B. L. Lau, Simon Lim Siak Boon, Sharon Lim Pei Siang, Yong Han, Songlin Liu, Xiaobai Wang
{"title":"Comprehensive Design and Analysis of Fan-Out Wafer Level Package","authors":"Xiaowu Zhang, Y. Andriani, M. C. Jong, L. Bu, B. L. Lau, Simon Lim Siak Boon, Sharon Lim Pei Siang, Yong Han, Songlin Liu, Xiaobai Wang","doi":"10.1109/EPTC47984.2019.9026620","DOIUrl":null,"url":null,"abstract":"This paper presents an advanced modeling technology on wafer warpage after post mold curing (PMC) for the 12 inch mold-1st Fan-Out Wafer Level Packaging (FOWLP) with consideration of effects of viscoelastic model and chemical cure shrinkage, and layer design of the mold-1st packages. Results show that warpage of mold-1st FOWLP wafer predicted by the advanced modeling technology agrees well with the experimental result. A new guideline for FOWLP process flow is provided as well, which will be useful to the packaging industry. The advantages of the new guideline for FOWLP process flow are: (1) to eliminate wafer warpage correction process and save a lot of cost and time; (2) to serve as a basis for process selection to meet the trends and needs of a reliable fan-out wafer level package with lower wafer warpage during FOWLP wafer process; and (3) to be important to enhance survivability during wafer process and thin-wafer handling.","PeriodicalId":244618,"journal":{"name":"2019 IEEE 21st Electronics Packaging Technology Conference (EPTC)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE 21st Electronics Packaging Technology Conference (EPTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EPTC47984.2019.9026620","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper presents an advanced modeling technology on wafer warpage after post mold curing (PMC) for the 12 inch mold-1st Fan-Out Wafer Level Packaging (FOWLP) with consideration of effects of viscoelastic model and chemical cure shrinkage, and layer design of the mold-1st packages. Results show that warpage of mold-1st FOWLP wafer predicted by the advanced modeling technology agrees well with the experimental result. A new guideline for FOWLP process flow is provided as well, which will be useful to the packaging industry. The advantages of the new guideline for FOWLP process flow are: (1) to eliminate wafer warpage correction process and save a lot of cost and time; (2) to serve as a basis for process selection to meet the trends and needs of a reliable fan-out wafer level package with lower wafer warpage during FOWLP wafer process; and (3) to be important to enhance survivability during wafer process and thin-wafer handling.