Leakage current characteristics of new SrBi4Ti4O15/CaBi4Ti4O15 thin-film capacitor with excellent electric stability

H. Kawahara, Naoya Tahara, Shuhei Nomura, K. Yamashita, M. Noda, H. Uchida, H. Funakubo
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Abstract

SrBi4Ti4O15 (SBTi) and CaBi4Ti4O15 (CBTi) dielectric films of Bismuth Layered Structure Dielectrics (BLSD) are examined as stacked-type dielectric capacitors for realizing excellent electric stability in capacitor device. It is revealed that the leakage current of the SBTi and CBTi is composed mainly from Schottky current for medium electric field range (about 100-350 kV/cm). The current is smaller by three order of magnitude than the BST single perovskite film, even with thinner thickness in the SBTi film. This indicates that the SBTi or CBTi film is effective for applying to high permittivity capacitor with the barium perovskite oxide family.
具有优异电稳定性的新型SrBi4Ti4O15/CaBi4Ti4O15薄膜电容器的漏电流特性
研究了铋层状结构电介质(BLSD)的SrBi4Ti4O15 (SBTi)和CaBi4Ti4O15 (CBTi)介质薄膜作为叠层式介质电容器,在电容器器件中实现了优异的电稳定性。结果表明,SBTi和CBTi的泄漏电流主要由中等电场范围(约100-350 kV/cm)的肖特基电流构成。该电流比BST单钙钛矿膜小3个数量级,即使SBTi膜的厚度较薄。这表明SBTi或CBTi薄膜可以有效地应用于钡钙钛矿氧化物族的高介电常数电容器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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