{"title":"Electrochemical assembly and molecular dynamics simulation of SAM on copper for epoxy/copper adhesion improvement","authors":"Stephen C. T. Kwok, M. Yuen","doi":"10.1109/EPTC.2013.6745759","DOIUrl":null,"url":null,"abstract":"This work reports on adhesion enhancement effects of self-assembled organothiol treatment on copper (Cu)/epoxy interface, as well as a significant reduction in treatment time under the influence of electric potential. The interfacial adhesion has 20-fold enhancement through the treatment due to improved linkage between copper substrate and epoxy layer by chemisorbed organothiol molecules. The treatment time was greatly reduced by a factor 32 from 16 hours to 30 minutes thanks to the electrical field assisted method without compromising the maximum adhesion strength, which was shown to be in order of 97.2Jm-2. Molecular Dynamics (MD) simulations were also carried out for studying the surface coverage effect of Self-assembly Monolayer (SAM) on Cu surface towards adhesion strength between Cuiepoxy interface. Simulation results together with experimental data were then used for explaining the adhesion promotion mechanism between Cu/epoxy interface.","PeriodicalId":210691,"journal":{"name":"2013 IEEE 15th Electronics Packaging Technology Conference (EPTC 2013)","volume":"422 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE 15th Electronics Packaging Technology Conference (EPTC 2013)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EPTC.2013.6745759","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This work reports on adhesion enhancement effects of self-assembled organothiol treatment on copper (Cu)/epoxy interface, as well as a significant reduction in treatment time under the influence of electric potential. The interfacial adhesion has 20-fold enhancement through the treatment due to improved linkage between copper substrate and epoxy layer by chemisorbed organothiol molecules. The treatment time was greatly reduced by a factor 32 from 16 hours to 30 minutes thanks to the electrical field assisted method without compromising the maximum adhesion strength, which was shown to be in order of 97.2Jm-2. Molecular Dynamics (MD) simulations were also carried out for studying the surface coverage effect of Self-assembly Monolayer (SAM) on Cu surface towards adhesion strength between Cuiepoxy interface. Simulation results together with experimental data were then used for explaining the adhesion promotion mechanism between Cu/epoxy interface.