The application of TCAD in industry

1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095) Pub Date : 1996-09-02 DOI:10.1109/SISPAD.1996.865313

J. Mar

引用次数: 13

Abstract

The key to making use of TCAD in industry is matching available capabilities to specific applications to multiply information from available experimental wafers. The art of using such partial capabilities is the focus of this paper. The following sections will describe applications of TCAD in four areas: technology selection, process optimization, process control, and design optimization.

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TCAD在工业中的应用

在工业中使用TCAD的关键是将可用功能与特定应用相匹配，从而从可用的实验晶圆中获得更多信息。使用这种部分功能的艺术是本文的重点。以下部分将描述TCAD在四个方面的应用:技术选择、过程优化、过程控制和设计优化。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095)

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