Application of HF solutions for the cleaning of TiSi2 surface

Abstract

HF-based solutions are widely used in microelectronics for surface cleaning. For example these solutions are very effective for the removal of SiO/sub 2/ formed during storage in air and for the passivation of a silicon surface. These solutions are also used for the final cleaning of TiSi/sub 2/ after the formation of contact holes in SiO/sub 2/. Nevertheless, the influence of HF solutions on the TiSi/sub 2/ properties and contact resistance with metal has not been studied. This work is devoted to the study of the influence of HF solutions on TiSi/sub 2/ properties.