Full-Band Monte Carlo simulations of GaAs p-i-n Avalanche PhotoDiodes: What Are the Limits of Nonlocal Impact Ionization Models?

A. Pilotto, F. Driussi, D. Esseni, L. Selmi, M. Antonelli, F. Arfelli, G. Biasiol, S. Carrato, G. Cautero, D. De Angelis, R. Menk, C. Nichetti, T. Steinhartova, P. Palestri
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引用次数: 2

Abstract

We present a Full-Band Monte Carlo (FBMC) investigation of impact ionization in GaAs p-i-n Avalanche Photodiodes (APDs). FBMC simulations have been used to compute the gain and the excess noise factor and a new equation has been derived for the extraction of history-dependent impact ionization coefficients from FBMC simulations. Results from FBMC are then compared with the ones of nonlocal historydependent impact ionization models. We found that at high reverse bias voltages it is important to take into account the fact that secondary carriers are generated with nonzero kinetic energy. Finally, we propose an improved history-dependent model using an energy-dependent mean free path.
GaAs p-i-n雪崩光电二极管的全带蒙特卡罗模拟:非局部冲击电离模型的限制是什么?
我们提出了一种全波段蒙特卡罗(FBMC)方法来研究砷化镓p-i-n雪崩光电二极管(apd)中的冲击电离。利用FBMC模拟计算了增益和多余噪声因子,并推导了从FBMC模拟中提取历史相关冲击电离系数的新方程。然后将FBMC的结果与非局部历史依赖的冲击电离模型的结果进行比较。我们发现,在高反向偏置电压下,重要的是要考虑到二次载流子产生的非零动能。最后,我们提出了一个改进的历史依赖模型,使用能量依赖的平均自由路径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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