The RIT Semiconductor & Microsystems Fabrication Laboratory: Challenges in Supporting a Growing Research Agenda

K. Hirschman, S. Blondell
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Abstract

The RIT Semiconductor & Microsystems Fabrication Laboratory (SMFL) has 10,000 sq. ft. of class 1000 clean room space, and provides fabrication resources for CMOS and MEMS devices on 100 & 150 mm silicon substrates. The primary mission of the facility, since its completion in 1986, is to provide support to the academic programs in microelectronic engineering. This support is for both teaching laboratories that are integral to the curriculum, as well as senior projects and graduate research activities. The process toolset is comprehensive, including ion implantation and e-beam maskmaking systems; tools not typically found in university laboratories. This enables all process sequences to be done completely "in house", providing our students with the unique hands-on experience of integrated circuit fabrication from design to final test. Around a decade ago RIT introduced a Ph.D. program in Microsystems Engineering, which was around a decade after RIT had introduced its first Ph.D. program in Imaging Science. Since that time the emphasis on research at RIT has increased dramatically, with the current number of Ph.D. programs at six. The priorities in support of research in the micro/nano arena (microsystems, nanophotonics, nanoelectronics, etc.) are quite different than the priorities in support of educational programs in microelectronic engineering. The teaching labs require process capabilities that are representative of what the students will see or use in an industrial facility, and cover all aspects of CMOS fabrication. While research activities may utilize CMOS processes, they also typically involve specialized tooling to do specific processes that do not necessarily benefit a significant fraction of the lab users. Faculty investigators may bring in funding for unique capabilities for their research, however, they typically do not bring in funding to help upgrade general-use process equipment, nor are they accustomed to securing equipment acquisitions through donations by industrial affiliates. In 2001 the decision to operate the SMFL as a separate unit outside of the Microelectronic Engineering Department was made by the administration in an attempt to expand the user base to other departments in engineering and science, and to support specific research initiatives. This began a series of changes in the operation of the SMFL, and presented several challenges involved with supporting research activities while ensuring that the quality of the services provided to the educational programs was not compromised. Internal funds have been provided to a number of research groups that utilize the SMFL resources, while the funds allocated for SMFL infrastructure and equipment upgrades has decreased significantly. In addition to financial considerations, there has also been an allocation of space to investigators for research activity in what was formerly general-use space. These trends have resulted in increased expenses associated with researchers who are not broad-spectrum users of the SMFL, and therefore do not pay significant lab fees to support the overall lab operations. While these trends are somewhat counterproductive, we have been successful in maintaining our facility and upgrading our toolset while continuing to provide a quality lab experience to our students. As times change and priorities evolve there must be certain concessions and compromises in order to support new initiatives while continuing to advance the state of the facility for the benefit of all lab users. This presentation will provide a reflection on the past, an update on the present, and a look toward the future of the SMFL at RIT.
RIT半导体与微系统制造实验室:支持不断增长的研究议程的挑战
RIT半导体与微系统制造实验室(SMFL)占地10,000平方英尺。1000级洁净室空间,并为100和150毫米硅衬底上的CMOS和MEMS器件提供制造资源。自1986年建成以来,该设施的主要任务是为微电子工程的学术项目提供支持。这种支持既包括课程中不可或缺的教学实验室,也包括高级项目和研究生研究活动。工艺工具集是全面的,包括离子注入和电子束掩模制造系统;大学实验室里通常找不到的工具。这使得所有的工艺序列完全“在内部”完成,为我们的学生提供集成电路制造从设计到最终测试的独特实践经验。大约十年前,RIT推出了微系统工程博士项目,这比RIT推出第一个成像科学博士项目晚了大约十年。从那时起,RIT对研究的重视急剧增加,目前博士项目的数量为6个。支持微/纳米领域(微系统、纳米光子学、纳米电子学等)研究的优先事项与支持微电子工程教育项目的优先事项截然不同。教学实验室需要的工艺能力是学生将在工业设施中看到或使用的代表,并涵盖CMOS制造的各个方面。虽然研究活动可能会利用CMOS工艺,但它们通常也涉及专门的工具来完成特定的工艺,而这些工艺不一定会使大部分实验室用户受益。学院研究人员可能会为其研究的独特能力提供资金,然而,他们通常不会为帮助升级通用工艺设备提供资金,也不习惯于通过工业附属机构的捐赠获得设备。2001年,政府当局决定将微型电子实验室作为微电子工程系之外的一个独立单位运作,以扩大其用户群至其他工程和科学部门,并支持具体的研究计划。这开始了SMFL运作的一系列变化,并提出了一些挑战,包括支持研究活动,同时确保为教育项目提供的服务质量不受影响。内部资金已提供给一些利用SMFL资源的研究小组,而分配给SMFL基础设施和设备升级的资金已大大减少。除了财政方面的考虑外,还在以前是一般用途的空间中为研究人员分配了用于研究活动的空间。这些趋势导致了与非SMFL广谱用户的研究人员相关的费用增加,因此不支付大量的实验室费用来支持整个实验室的运作。虽然这些趋势有些适得其反,但我们已经成功地维护了我们的设施和升级了我们的工具集,同时继续为我们的学生提供高质量的实验室体验。随着时代的变化和优先事项的发展,必须做出一定的让步和妥协,以支持新的倡议,同时继续推进设施的状态,以造福所有实验室用户。本演讲将提供对过去的反思,对现在的更新,并展望未来的SMFL在RIT。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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