Geometric Advection Algorithm for Process Emulation

Abstract

An algorithm is developed, which advects a material interface analytically, according to purely geometric considerations. This algorithm is implemented in ViennaLS, a sparse level set library and its applicability to common microelectronic fabrication processes is demonstrated. A pinch-off plasma CVD process is emulated using the presented algorithm. This algorithm is compared to common advection algorithms, showing a significant improvement in accuracy, with a performance penalty of a factor of about 2 when compared to simple advection schemes and a performance benefit of a factor of 6 when compared to more sophisticated schemes.