{"title":"EUV or 193i: Who wins the center stage for 7nm node HVM in 2018?","authors":"Yoshinori Nagaoka, J. Miyazaki","doi":"10.1117/12.2208944","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":308777,"journal":{"name":"SPIE Photomask Technology","volume":"138 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-10-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Photomask Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2208944","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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