Monte Carlo simulations of the transport of sputtered particles

Abstract

A model for Monte Carlo calculation of the transport of sputtered particles is presented which allows to estimate the density of sputtered material in the gas phase of a low pressure DC magnetron discharge. Simulation of DC magnetron sputtering of Cu in 0.1 Pa of Ar using an average target power density 2 W/cm/sup 2/ shows that Cu concentration is below 1% in most of the discharge volume. The influence of the process parameters on the relative Cu density is discussed.