Numerical analysis of light-trapping structure in nanoimprinted-textured silicon solar cell

2013 IEEE International Meeting for Future of Electron Devices, Kansai Pub Date : 2013-06-05 DOI:10.1109/IMFEDK.2013.6602223

S. Yoshinaga, Y. Ishikawa, S. Araki, Y. Uraoka

引用次数: 0

Abstract

We calculated the light trapping effect of nanoimprinted-textured (NT) structure for monocrystalline silicon solar cell using 2-dimentional simulator. Our calculation revealed that the 10 μm width for textured pyramid, in the case of ZnO used as a NT material, produced lower efficiency than the cell without NT structure, due to the light absorbance in the ZnO layer in short length region. On the other hand, ZrO2-NT cell performance showed the highest efficiency of 23 %. In addition, we found the optimized texture width was 0.25 μm for both materials.

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纳米压印纹理硅太阳能电池光捕获结构的数值分析

利用二维模拟装置计算了单晶硅太阳能电池纳米印迹纹理(NT)结构的光捕获效应。我们的计算表明，当ZnO作为NT材料时，10 μm宽度的纹理金字塔比没有NT结构的电池产生的效率低，这是由于ZnO层在短长度区域的光吸收。另一方面，ZrO2-NT电池的效率最高，达到23%。此外，我们发现两种材料的织构宽度均为0.25 μm。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2013 IEEE International Meeting for Future of Electron Devices, Kansai

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