Impacts of intrinsic device variations on the stability of FinFET subthreshold SRAMs

Yin-Nien Chen, Chien-Yu Hsieh, M. Fan, V. Hu, P. Su, C. Chuang
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引用次数: 4

Abstract

In this work, we investigate the impacts of intrinsic device variations on FinFET subthreshold SRAMs, including the conventional tied-gate 6T SRAM, tied-gate 10T Schmitt Trigger based SRAMs, and recently proposed independent-gate controlled 8T Schmitt Trigger based SRAMs. The impacts of intrinsic random device variations, including Fin Line-Edge Roughness (LER) and Work Function Variation (WFV), on the device threshold voltage Vth, Subthreshold Swing (S.S.) and stability of FinFET SRAMs operating in subthreshold region are assessed using 3D atomistic mixed-mode Monte-Carlo simulations. The results indicate that Fin LER is the dominant factor limiting the stability of FinFET subthreshold SRAMs, since Fin LER degrades both Vth fluctuation and S.S., while WFV mainly affects only Vth fluctuation. The independent-gate controlled Schmitt Trigger SRAMs are shown to offer adequate stability for the intended subthreshold applications even considering intrinsic device variations.
器件固有变化对FinFET亚阈值sram稳定性的影响
在这项工作中,我们研究了固有器件变化对FinFET亚阈值SRAM的影响,包括传统的束缚门6T SRAM,基于束缚门10T Schmitt触发器的SRAM,以及最近提出的基于独立门控制的8T Schmitt触发器的SRAM。利用三维原子混合模式蒙特卡罗模拟,评估了器件的内在随机变化(包括鳍线边缘粗糙度(LER)和功函数变化(WFV))对器件阈值电压Vth、亚阈值摆幅(S.S.)和工作在亚阈值区域的FinFET sram稳定性的影响。结果表明,Fin - LER是限制FinFET亚阈值sram稳定性的主要因素,因为Fin - LER同时降低了Vth波动和S.S,而WFV主要只影响Vth波动。独立门控制的施密特触发sram被证明为预期的亚阈值应用提供足够的稳定性,即使考虑到固有的器件变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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