Validated electro-thermal simulations of two different power MOSFET technologies and implications on their robustness

S. de Filippis, R. Illing, M. Nelhiebel, S. Decker, H. Kock, A. Irace
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引用次数: 3

Abstract

Power MOSFETs integrated in modern Smart Power switches feature a substantial high current capability due to the very low value of their transconductance coefficient K. In this paper we demonstrate that the trend related to the increasing current capability implies a reduced thermal stability range which may lead to less robust devices. Electro-thermal simulations of two test chips featuring two different technologies show that the higher the value of K, the less stable the device thermal behavior. Simulation results have been validated by means of temperature measurements performed using an integrated temperature sensor.
验证了两种不同功率MOSFET技术的电热仿真及其鲁棒性的影响
集成在现代智能功率开关中的功率mosfet具有相当高的电流能力,因为它们的跨导系数k值非常低。在本文中,我们证明了与电流能力增加相关的趋势意味着热稳定性范围的减小,这可能导致器件的鲁棒性降低。采用两种不同技术的两种测试芯片的电热模拟表明,K值越高,器件热行为越不稳定。通过使用集成温度传感器进行温度测量,验证了仿真结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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