Signal-Power Interconnect Co-Design Based on Various Technology Options

D. Shim, A. Kini, M. Mallikarjuna, Piyush Kumar, A. Naeemi
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Abstract

While the impact of various BEOL improvements on circuit-level PPA has been well studied, their implications for PDNs have not been properly explored. This paper presents a signal-power co-optimization flow using early IR drop analysis after the placement stage. Using this flow, we studied the impact of thinning down the metal barriers of Cu interconnects or replacing Cu with Ru at the local level on PDN and circuit performance. We observed that the design frequency improves by 66% by thinning down the metal barriers and by 58.3% by replacing local Cu interconnects with Ru for a given IR drop budget.
基于多种技术选择的信号-功率互连协同设计
虽然各种BEOL改善对电路级PPA的影响已经得到了很好的研究,但它们对pdn的影响尚未得到适当的探讨。本文提出了一种基于早期红外下降分析的信号功率协同优化流程。利用这一流程,我们研究了稀释铜互连的金属屏障或在局部水平上用Ru代替Cu对PDN和电路性能的影响。我们观察到,在给定的红外下降预算下,通过减少金属屏障,设计频率提高了66%,通过用Ru代替局部Cu互连,设计频率提高了58.3%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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