{"title":"A novel high voltage Pch-MOS with a new drain drift structure for 1200V HVICs","authors":"M. Yoshino, K. Shimizu","doi":"10.1109/ISPSD.2013.6694401","DOIUrl":null,"url":null,"abstract":"A new 1200V Pch-MOS having a new drain structure is proposed. Our proposing new 1200V Pch-MOS improves a substrate leak problem which occurred in conventional one without sacrificing a breakdown voltage and an output current. Thanks to the new Pch-MOS, a 1200V HVIC which provides a high voltage level-shifting from high voltage region to low voltage region is successfully realized.","PeriodicalId":175520,"journal":{"name":"2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD)","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-05-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2013.6694401","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
A new 1200V Pch-MOS having a new drain structure is proposed. Our proposing new 1200V Pch-MOS improves a substrate leak problem which occurred in conventional one without sacrificing a breakdown voltage and an output current. Thanks to the new Pch-MOS, a 1200V HVIC which provides a high voltage level-shifting from high voltage region to low voltage region is successfully realized.