{"title":"Correlations between initial via resistance and reliability performance","authors":"C. Graas, H. A. Le, T.A. Rosi","doi":"10.1109/RELPHY.1997.584233","DOIUrl":null,"url":null,"abstract":"Accelerated stressing and electromigration (EM) testing were conducted on W-plug via chains and Van der Pauw structures respectively. These populations were chosen to include a wide distribution of initial resistances R/sub 0/. The high-end of the R/sub 0/ distribution exhibited a higher early failure rate and a higher spread in EM time-to-fail distribution. Processes which produce tightly controlled time-zero via resistance distributions are more desirable for via reliability.","PeriodicalId":193458,"journal":{"name":"1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RELPHY.1997.584233","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
Accelerated stressing and electromigration (EM) testing were conducted on W-plug via chains and Van der Pauw structures respectively. These populations were chosen to include a wide distribution of initial resistances R/sub 0/. The high-end of the R/sub 0/ distribution exhibited a higher early failure rate and a higher spread in EM time-to-fail distribution. Processes which produce tightly controlled time-zero via resistance distributions are more desirable for via reliability.