OPC development in action for advanced technology nodes

A. Wang, M. Fujimoto, P. V. van Adrichem, I. Bork, H. Yamashita
{"title":"OPC development in action for advanced technology nodes","authors":"A. Wang, M. Fujimoto, P. V. van Adrichem, I. Bork, H. Yamashita","doi":"10.1117/12.746838","DOIUrl":null,"url":null,"abstract":"In leading edge technologies, Optical Proximity Correction (OPC) plays a critical role in the total imaging flow. Large investments in terms of time and engineering resources are made to obtain the required models and recipes to get the OPC job done. In the model building area, the metrology component is becoming more and more critical. Questions like which structures to put in a calibration pattern, how to measure, where to measure them, and how often has a serious impact on the calibration dataset, and thus on the final model. Corner rounding starts to become an increasingly important factor in imaging and device performance. Because of this, the model 2D behavior needs to be verified as the least, using reliable metric. In this paper two techniques are described. Finally the cost of model building is discussed. When the number of measurements for a model calibration is considered, available machine time almost always plays a key role. In this paper, a slightly different approach is made on this problem by looking at the cost of the different components of model calibration, and how that is going to progress in the process generations to come.","PeriodicalId":308777,"journal":{"name":"SPIE Photomask Technology","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Photomask Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.746838","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

In leading edge technologies, Optical Proximity Correction (OPC) plays a critical role in the total imaging flow. Large investments in terms of time and engineering resources are made to obtain the required models and recipes to get the OPC job done. In the model building area, the metrology component is becoming more and more critical. Questions like which structures to put in a calibration pattern, how to measure, where to measure them, and how often has a serious impact on the calibration dataset, and thus on the final model. Corner rounding starts to become an increasingly important factor in imaging and device performance. Because of this, the model 2D behavior needs to be verified as the least, using reliable metric. In this paper two techniques are described. Finally the cost of model building is discussed. When the number of measurements for a model calibration is considered, available machine time almost always plays a key role. In this paper, a slightly different approach is made on this problem by looking at the cost of the different components of model calibration, and how that is going to progress in the process generations to come.
OPC开发行动中的先进技术节点
在前沿技术中,光学接近校正(OPC)在整个成像流程中起着至关重要的作用。为了获得所需的模型和配方来完成OPC工作,在时间和工程资源方面进行了大量投资。在模型构建领域,计量组件变得越来越重要。诸如在校准模式中放入哪些结构、如何测量、在哪里测量以及多久测量一次等问题对校准数据集产生严重影响,从而对最终模型产生影响。圆角开始成为成像和设备性能中越来越重要的因素。因此,需要使用可靠的度量来验证模型的二维行为。本文介绍了两种技术。最后讨论了模型构建的成本。当考虑模型校准的测量次数时,可用的机器时间几乎总是起关键作用。在本文中,通过观察模型校准的不同组成部分的成本,以及如何在未来的过程中进行,对这个问题采取了稍微不同的方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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