An easy technique for determining diffusion and generation-recombination components of the current of pn junctions for better modelling

C. Cané, M. Lozano, I. Gràcia, J. Santander, E. Lora-Tamayo
{"title":"An easy technique for determining diffusion and generation-recombination components of the current of pn junctions for better modelling","authors":"C. Cané, M. Lozano, I. Gràcia, J. Santander, E. Lora-Tamayo","doi":"10.1109/ICMTS.1993.292926","DOIUrl":null,"url":null,"abstract":"A method for determining the diffusion and generation-recombination components of the current of a pn junction is presented. It is based on the double derivation of the I-V characteristic and obtains two parameters which can be used for a better modeling of this device, compared with the standard model that includes the extrapolated saturation current and the ideality factor. The technique detects the point where high injection and series resistance acquire importance, in order to extract the desired parameters below this point. As the technique is fully automatic, it is suitable when wafer mapping and statistical data are desired. The system can be applied to any silicon pn junction and the results of a well junction of a standard CMOS circuit are presented as an example.<<ETX>>","PeriodicalId":123048,"journal":{"name":"ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.1993.292926","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

A method for determining the diffusion and generation-recombination components of the current of a pn junction is presented. It is based on the double derivation of the I-V characteristic and obtains two parameters which can be used for a better modeling of this device, compared with the standard model that includes the extrapolated saturation current and the ideality factor. The technique detects the point where high injection and series resistance acquire importance, in order to extract the desired parameters below this point. As the technique is fully automatic, it is suitable when wafer mapping and statistical data are desired. The system can be applied to any silicon pn junction and the results of a well junction of a standard CMOS circuit are presented as an example.<>
一个简单的技术来确定扩散和产生-重组组件的pn结电流更好的建模
提出了一种确定pn结电流的扩散分量和产生-复合分量的方法。与包含外推饱和电流和理想因子的标准模型相比,该模型基于I-V特性的双重推导,得到了两个参数,可以更好地用于该器件的建模。该技术检测高注入和串联电阻至关重要的点,以便在该点以下提取所需参数。由于该技术是全自动的,因此适用于需要晶圆映射和统计数据的情况。该系统可以应用于任何硅pn结,并给出了一个标准CMOS电路的良好结的结果作为例子。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信