{"title":"CDM failure modes in a 130nm ASIC technology","authors":"C. Brennan, J. Sloan, D. Picozzi","doi":"10.1109/EOSESD.2004.5272610","DOIUrl":null,"url":null,"abstract":"CDM failures in I/O cells in a 130 nm CMOS ASIC technology are studied. Most failures occurred in internal circuits that were not connected to chip pads. The failures correlate to the I/O power supply network resistance at the I/O cells. Failure modes include gate oxide ruptures on internal nodes driven by active circuits.","PeriodicalId":302866,"journal":{"name":"2004 Electrical Overstress/Electrostatic Discharge Symposium","volume":"62 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"25","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2004 Electrical Overstress/Electrostatic Discharge Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EOSESD.2004.5272610","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 25
Abstract
CDM failures in I/O cells in a 130 nm CMOS ASIC technology are studied. Most failures occurred in internal circuits that were not connected to chip pads. The failures correlate to the I/O power supply network resistance at the I/O cells. Failure modes include gate oxide ruptures on internal nodes driven by active circuits.