Zirconium diboride low resistance layers

Abstract

The ion-plasma sputtering method, as we see it, is perspective for the zirconium diboride thin films production. The literature sources on the zirconium diboride thin films growth characteristics are sparse. The goal of this paper is to investigate the possibility of the zirconium diboride thin films production with the magnetron sputtering method and to investigate its structure and physical properties.