Sensitivity-independent extraction of Vth variation utilizing log-normal delay distribution

A. M. Mahfuzul Islam, H. Onodera
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引用次数: 6

Abstract

We propose an area-efficient and low-cost extraction methodology of Vth variation which utilizes the exponential relationship of gate delay to Vth variation. The exponential relationship is achieved by operating the DUT in the weak inversion region. Utilizing a previously proposed pass-gate based topology-reconfigurable ring oscillator, the weak inversion operation of a specific gate is achieved while maintaining a much higher supply voltage for the overall circuit. Area-efficiency is achieved by altering the individual gate topology and measuring for each topology. Based on a pass-gate inserted inverter delay model, the relationship of delay variation to Vth variation is expressed using the body effect and DIBL coefficients. Thus, the proposed method does not require any sensitivity calculation. Vth variation is then extracted from the measured delay distributions directly. A test chip containing three different sizes of DUTs are fabricated in a 65-nm bulk CMOS process. Vth variation of nMOSFET and pMOSFET for three different DUT sizes are successfully extracted. The methodology is suitable for low-cost, area-efficient and all-digital measurement of Vth variation.
利用对数正态延迟分布的灵敏度无关的Vth变化提取
我们提出了一种利用栅极延迟与Vth变化的指数关系的面积高效和低成本的Vth变化提取方法。指数关系是通过在弱反转区操作DUT来实现的。利用先前提出的基于通栅的拓扑可重构环振荡器,实现了特定门的弱反转操作,同时保持了整个电路的高得多的供电电压。面积效率是通过改变单个栅极拓扑和测量每个拓扑来实现的。基于插入通栅的逆变器延迟模型,利用体效应和DIBL系数表达了延迟变化与Vth变化的关系。因此,该方法不需要进行灵敏度计算。然后直接从测量的延迟分布中提取第v个变化。采用65纳米体CMOS工艺制备了包含三种不同尺寸dut的测试芯片。成功地提取了三种不同被测器件尺寸下nMOSFET和pMOSFET的第v次变化。该方法适用于低成本、高效、全数字化的Vth变化测量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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