Measurement of MOSFET C-V Curve Variation Using CBCM Method

K. Tsuji, K. Terada, T. Nakamoto, T. Tsunomura, A. Nishida
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引用次数: 9

Abstract

The test circuit, in which the cells including CBCMs (Charge-Based Capacitance Measurements) are arrayed in matrix shape, is developed to measure MOSFET capacitance variation. By adjusting the bias condition of the test circuit, it is able to obtain C-V curves for many MOSFETs. Additionally, a variation of threshold voltage is extracted from the estimated C-V curve variation. The obtained threshold voltage variations are close to those which are obtained from current-voltage characteristics.
用CBCM法测量MOSFET C-V曲线变化
在测试电路中,包括cbcm(电荷基电容测量)的单元以矩阵形状排列,用于测量MOSFET电容变化。通过调整测试电路的偏置条件,可以得到许多mosfet的C-V曲线。此外,从估计的C-V曲线变化中提取阈值电压的变化。所得的阈值电压变化与由电流-电压特性得到的值接近。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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