Evidence of charge carrier number fluctuations in InN thin films?

G. R. Mutta, B. Guillet, L. Méchin, A. Vilalta‐Clemente, J. Grandal, M. Sánchez-García, Sara Martin, F. Calle, P. Ruterana, J. Routoure
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Abstract

Due to its small band-gap and its high mobility, InN is a promising material for a large number of key applications like band-gap engineering for high efficiency solar cells, light emitting diodes, and high speed devices. Unfortunately, it has been reported that this material exhibits strong surface charge accumulation which may depend on the type of surface. Current investigations are conducted in order to explain the mechanisms which govern such a behavior and to look for ways of avoiding it and/or finding applications that may use such an effect. In this framework, low frequency noise measurements have been performed at different temperatures on patterned MBE grown InN layers. The evolution of the 1/f noise level with temperature in the 77 K-300 K range is consistent with carrier number fluctuations thus indicating surface mechanisms: the surface charge accumulation is confirmed by the noise measurements.
InN薄膜中载流子数波动的证据?
由于其小带隙和高迁移率,InN是一种有前途的材料,用于大量关键应用,如高效太阳能电池,发光二极管和高速器件的带隙工程。不幸的是,据报道,这种材料表现出强烈的表面电荷积累,这可能取决于表面的类型。目前进行的调查是为了解释控制这种行为的机制,寻找避免这种行为的方法和/或找到可能利用这种效果的应用程序。在这个框架下,在不同的温度下对有图案的MBE生长的InN层进行了低频噪声测量。在77 K-300 K范围内,1/f噪声级随温度的演变与载流子数波动一致,从而表明了表面机制:表面电荷积累得到噪声测量的证实。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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