Effects of substrate design on underfill voiding using the low cost, high throughput flip chip assembly process

D. Milner, D. Baldwin
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引用次数: 4

Abstract

Voiding is a concern in low cost, high throughput, or "no-flow" flip chip assembly. This process involves chip placement directly on the pad site with pre-dispensed no-flow underfill on it. The forced motion causes a convex flow front to pass over pad and mask-opening features, promoting void capture. This paper determines the effects of substrate design on underfill voiding using the no-flow process. A full-factorial design experiment analyzes several empirically determined factors that can affect void capture in no-flow processing, including pad height, solder mask opening height, pad/solder mask opening separation, pad pitch, chip placement speed, and underfill viscosity. Test substrates were designed and manufactured at Georgia Tech's Packaging Research Center to ensure process control. The design consisted of 6 factors with a mix of levels for each. These included four levels of copper pad heights, two solder mask opening heights, three pad/solder mask separation distances between copper pad and solder mask opening edges, three feature (pad/mask openings) pitches, two chip placement speeds and four pad/mask geometries separated into pad site quadrants. The experiments involve placement of a transparent glass chip on the pad site through a predispensed no-flow underfill. Subsequent flow of the underfill is carefully recorded and resultant voids are logged and analyzed. The response variable is defined as the number of voids created in the process, and is further analyzed for the location and any visible modes of void formation. Thus, improved substrate designs can be derived.
采用低成本、高通量倒装芯片组装工艺的衬底设计对下填空的影响
在低成本、高通量或“无流”倒装芯片组装中,空化是一个值得关注的问题。这一过程包括直接将芯片放置在垫片上,并在垫片上预先分配无流底填料。强制运动导致凸流锋通过垫和掩膜开口特征,促进空隙捕获。本文采用无流工艺确定了衬底设计对下填料空化的影响。一项全因子设计实验分析了在无流处理过程中影响空隙捕获的几个经验确定的因素,包括焊盘高度、阻焊口高度、焊盘/阻焊口间距、焊盘间距、芯片放置速度和下填充粘度。测试基板是在佐治亚理工学院封装研究中心设计和制造的,以确保过程控制。该设计由6个因素组成,每个因素的水平混合。其中包括四个级别的铜垫高度,两个阻焊口高度,铜垫和阻焊口边缘之间的三个焊垫/阻焊分离距离,三个特征(焊垫/阻焊口)间距,两个芯片放置速度和四个分离到焊垫位置象限的焊垫/阻焊几何形状。实验包括通过预先分配的无流底填料在垫上放置透明玻璃芯片。仔细记录下填土的后续流动,并记录和分析由此产生的空洞。响应变量定义为过程中产生的空洞数量,并进一步分析空洞形成的位置和任何可见模式。因此,可以推导出改进的衬底设计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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