The HMM-TLP Miscorrelation at Wafer Level Tests

V. Vashchenko, D. Marreiro, S. Malobabic, H. Sarbishaei, A. Shibkov
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引用次数: 3

Abstract

A strong miscorrelation between TLP maximum current to failure and corresponding estimated onwafer-HMM pulse passing level of dual-direction SCR ESD device was studied. For multiple SCR ESD devices in 5-80V voltage range the effect was represented by low HMM passing level due to burnout of the structure Npocket to P-substrate isolation junction. It is shown that the phenomenon is specific to the on-wafer HMM test setup itself and is the result of the direct strong coupling of the wafer to the prober chuck at system ground under inductive impedance of the HMM tool connection to the DUT.
薄片水平测试中的HMM-TLP不相关
研究了双向可控硅ESD器件TLP最大失效电流与相应的晶圆- hmm脉冲通过电平之间的强不相关。对于5-80V电压范围内的多个可控硅ESD器件,由于结构Npocket到p衬底隔离结的烧毁,其影响表现为低HMM通过水平。结果表明,这种现象是晶圆上HMM测试装置本身特有的,是在连接到被测件的HMM工具的感应阻抗下,晶圆与系统接地处的探头卡盘直接强耦合的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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