Time and voltage dependence of dielectric charging in RF MEMS capacitive switches

R. W. Herfst, P. Steeneken, Jurriaan Schmitz
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引用次数: 53

Abstract

A major issue in the reliability of RF MEMS capacitive switches is charge injection in the dielectric. In this study the authors try to establish the time and voltage dependence of dielectric charging in RF MEMS with silicon nitride as a dielectric. It is shown that the voltage shift of the CV-curve due to injected charge shows a radict dependence over a large time range. By doing measurements on a large number of devices (early development material made at NXP Semiconductors in Nijmegen) the authors further show that the charging rate increases exponentially with the applied stress voltage
射频MEMS电容开关介质充电的时间和电压依赖性
影响射频MEMS电容开关可靠性的一个主要问题是介电介质中的电荷注入。在本研究中,作者试图建立以氮化硅为介质的射频MEMS中介电充电的时间和电压依赖关系。结果表明,在较大的时间范围内,由注入电荷引起的cv曲线的电压位移呈完全依赖关系。通过对大量器件(由奈梅亨NXP半导体公司制造的早期开发材料)进行测量,作者进一步表明,充电速率随着施加的应力电压呈指数增长
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