The properties comparison between Au and Cu wires bond in DRAM component

Yi Heang Chen, M. Hsiao, C. Tseng
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引用次数: 2

Abstract

Although Au wires is a popular bonding material in IC package. But the trend to replace Au wire with Cu in wire bonding process has become an important trend in semiconductor package. To explore properties variation for these two wires bond. We focused on mechanical, electrical, physical related properties comparison between Au and Cu wires bond in DRAM component. The test vehicles with both Au and 4N purity (99.99 wt%) Cu wires and then diameter size were 25um. To investigate mechanical properties of IMC formation on Au and Cu wires bond-ability on Al pad, both ball shear and wire pull tests were performed on test samples. In electrical related evolution result displayed that Cu wire was lower than Au wire bond in resistance increase rate up to thermal aging 500hr. SEM cross-sectioned was performed to identify IMC growth rate of Cu-Al pad is slower than that of Au-Al pad due to two raw materials with variation chemical property. Moreover, IMC growth behavior is different between Cu and Au wires bond. From this study result, we obtained Cu with advantages than Au in properties of wires bond.
DRAM元件中金线与铜线结合的性能比较
虽然金线是集成电路封装中常用的键合材料。而在线键合工艺中以铜代替金线已成为半导体封装的重要趋势。探讨这两种金属丝结合后的性能变化。我们重点比较了金线和铜线在DRAM元件中键合的机械、电气、物理等相关性能。测试车辆采用Au和4N纯度(99.99 wt%)的铜线,然后直径尺寸为25um。为了研究铝衬垫上Au和Cu丝形成IMC的力学性能,对试样进行了球剪和拉丝试验。电学演化结果表明,在热老化500hr时,Cu线的电阻增长率低于Au线。SEM分析表明,由于两种原料的化学性质不同,Cu-Al衬垫的IMC生长速度比Au-Al衬垫慢。此外,铜线和金线的IMC生长行为不同。从这一研究结果中,我们得到了Cu在导线键合性能上优于Au的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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