L. Ngwendson, I. Deviny, C. Zhu, I. Saddiqui, J. Hutchings, C. Kong, Y. Wang, H. Luo
{"title":"New Locos Trench Oxide IGBT Enables 25% Higher Current Density in 4.5kV/1500A Module","authors":"L. Ngwendson, I. Deviny, C. Zhu, I. Saddiqui, J. Hutchings, C. Kong, Y. Wang, H. Luo","doi":"10.1109/ISPSD.2019.8757651","DOIUrl":null,"url":null,"abstract":"In this paper we present first results of a 4.5kV/1500A IGBT module using new LOCOS (Local Oxidation of Silicon) Trench Oxide IGBTs (LTO-IGBT). It is shown that this new module with increased current density compared to the previous DMOS generation, also show very robust dynamic and competitive performance at $\\mathbf{T}_{\\mathbf{J}}=150^{0}\\mathbf{C}$.","PeriodicalId":225029,"journal":{"name":"2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)","volume":"111 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2019.8757651","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
In this paper we present first results of a 4.5kV/1500A IGBT module using new LOCOS (Local Oxidation of Silicon) Trench Oxide IGBTs (LTO-IGBT). It is shown that this new module with increased current density compared to the previous DMOS generation, also show very robust dynamic and competitive performance at $\mathbf{T}_{\mathbf{J}}=150^{0}\mathbf{C}$.