Dynamic Multi-Frequency Test Method for Hidden Interconnect Defects

Somayeh Sadeghi Kohan, S. Hellebrand
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引用次数: 2

Abstract

In today’s system-on-chips, interconnect has an important role and affects the system’s reliability more than in conventional technologies. Interconnects suffer from crosstalk defects that result in delay and glitch faults. Furthermore, fab-induced variations lead to different sizes of crosstalk defects. The largest crosstalk defects are detected by conventional interconnect test methods, while the smaller ones do not change the system behavior and are left without detection. In this paper, we show that even smaller crosstalk defects have an inevitable impact on electro-migration (EM) degradation. They increase the current that conveys through the wire and consequently result in more EM degradation and shorter mean time to failure of the system. Simulation results show that in the worst case the EM degradation increases up to 90%, however, even in the normal situation 7.2% degradation can be observed for the PARSEC 2000 benchmark Because these Hidden Interconnect Defects cause different small delay sizes, we propose a multi-frequency test method to detect them properly. Our experimental results for 8000 different 32-bit interconnect layouts show that, on average, 6 frequencies and 81 test patterns are required for finding hidden interconnect defects.
互连隐藏缺陷的动态多频测试方法
在当今的片上系统中,互连技术对系统可靠性的影响比传统技术更大。互连遭受串扰缺陷,导致延迟和小故障。此外,晶圆厂诱导的变化导致串扰缺陷的大小不同。传统互连测试方法可以检测到最大的串扰缺陷,而较小的串扰缺陷不会改变系统行为,因此无需检测。在本文中,我们证明了即使较小的串扰缺陷也会对电迁移(EM)退化产生不可避免的影响。它们增加了通过导线传输的电流,从而导致更多的电磁退化和更短的系统故障平均时间。仿真结果表明,在最坏的情况下,电磁衰减可达90%,而在PARSEC 2000基准测试中,即使在正常情况下,也可以观察到7.2%的衰减。我们对8000种不同的32位互连布局的实验结果表明,平均需要6个频率和81个测试模式来发现隐藏的互连缺陷。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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