Delamination prediction in stacked back-end structure underneath bond pads

B.A.E. van Hal, G.Q. Zhang, M. van Gils, R. Peerlings
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引用次数: 3

Abstract

The thermo-mechanical reliability of integrated circuits (ICs) gains importance due to the reducing feature sizes and the application of new materials. This paper focuses on the delamination in the stacked back-end structure underneath bond pads. Current simulation tools predict this failure mode following a linear elastic fracture mechanics approach; whereas an interface damage mechanics (IDM) approach would be more appropriate to our opinion. The basics of IDM by cohesive zone modeling are outlined. The cohesive zone finite element under consideration is a two-dimensional (2D) linear element for small deformations with an exponential traction separation law. A 2D plane strain model represents a simplified microstructure underneath a bond pad. Several finite element (FE) meshes are constructed with gradually decreasing mesh sizes along the interfaces. Furthermore, two cohesive zone parameter sets are considered, one for 'weak' adhesion between the material layers and one for 'strong' adhesion. The simulations with the FE models demonstrate the capability of IDM to simulate the damage evolution, where several interfacial cracks develop simultaneously. The effect of mesh refinement is illustrated. It improves the convergence of the applied nonlinear solution procedure. Furthermore, the correlation between the adhesion strength and the complexity of the equilibrium path is shown. Finally the conclusions are drawn for the current research and recommendations are given for the further development of IDM applied to delamination prediction in IC back-end structures
粘结垫层下堆叠后端结构的分层预测
由于特征尺寸的减小和新材料的应用,集成电路的热机械可靠性变得越来越重要。本文主要研究了粘结垫层下后端结构的分层现象。目前的模拟工具采用线弹性断裂力学方法预测这种破坏模式;而界面损伤机制(IDM)方法更适合我们的观点。概述了通过内聚区建模实现IDM的基本原理。所考虑的黏结区有限元是一个具有指数牵引分离律的小变形二维线性单元。二维平面应变模型表示键垫下的简化微观结构。沿界面逐步减小网格尺寸,构建了多个有限元网格。此外,还考虑了两个粘接区参数集,一个用于材料层之间的“弱”粘接,另一个用于“强”粘接。利用有限元模型进行的仿真表明,IDM能够模拟多个界面裂纹同时出现的损伤演化过程。说明了网格细化的效果。它提高了应用的非线性求解过程的收敛性。此外,还研究了平衡路径的复杂性与黏附强度之间的关系。最后对目前的研究进行了总结,并对IDM在集成电路后端结构分层预测中的进一步发展提出了建议
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