A new technique to extract the gate bias dependent s/d series resistance of sub-100nm MOSFETs

D. Fleury, A. Cros, G. Bidal, H. Brut, E. Josse, G. Ghibaudo
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引用次数: 12

Abstract

In this study, a new technique to extract the S/D series resistance (Rsd) from the total resistance versus transconductance gain plot Rtot(1/β) is proposed. The technique only requires the measurement of Id(Vgs)|Vgt and β, allowing fast and statistical analysis in an industrial context. Unlike the usual Rtot(L)-based techniques, it has the advantage of being insensitive to the channel length and mobility variations and finally enables to extract very accurate values for Rsd(Vgs) and the effective mobility reduction factor µeff(Vgt)/µeff(0).
一种提取亚100nm mosfet栅极偏置相关s/d串联电阻的新技术
本文提出了一种从总电阻与跨导增益图Rtot(1/β)中提取S/D串联电阻(Rsd)的新方法。该技术只需要测量Id(Vgs), |Vgt和β,允许在工业环境中进行快速和统计分析。与通常基于Rtot(L)的技术不同,它具有对通道长度和迁移率变化不敏感的优点,最终能够提取非常准确的Rsd(Vgs)和有效迁移率降低因子μ eff(Vgt)/ μ eff(0)的值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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