Open/resistive defect localization using OBIRCH technique

2016 IEEE 23rd International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) Pub Date : 2016-07-18 DOI:10.1109/IPFA.2016.7564278

Song Jinrong, Fan Diwei, W. Winter, Wen Gaojie, T. Li, Qi Changyan

引用次数: 0

Abstract

OBIRCH technique is widely used in locating a leakage related defect. Actually, when combined with current path analysis, OBIRCH can also be an effective method in the localization of an open/resistive defect. This paper presented several real cases to show the application of OBIRCH during the analysis of open/resistive fault.

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利用OBIRCH技术定位开/阻缺陷

OBIRCH技术广泛应用于泄漏缺陷的定位。实际上，当与电流路径分析相结合时，OBIRCH也可以成为一种有效的开放性/阻性缺陷定位方法。本文通过几个实例说明了OBIRCH在开路/阻性故障分析中的应用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2016 IEEE 23rd International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)

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