Physical effects from etching parameters of the Bragg Grating Waveguide fabricated on porous silicon nanostructure

A. Radzi, S. Yusop, N. Ikhsan, M. Rusop, S. Abdullah
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Abstract

Multilayer structure of Bragg Grating Waveguide (BGW), porous silicon (PSi)-based was fabricated and characterized. The BGW was directly etched on a PSi-based planar waveguide. Adjustment of parameters for the electrochemical process will let the realization of multilayer properties of PSi. Fabricated BGW structure depends on thickness and layers of porous structure, and also average pore size. It is well known from previous study that the modulation of multilayer PSi much affected by the HF concentration of electrolyte, etching time, and current density applied during the electrochemical etching process. Surface homogeneity and layer uniformity are also the scope of study and both are much relying on those factors. The average refractive index, n and pore sizes for the multilayer structure were determined and the comparison of the results based from the study was shown. Fabricated BGW on PSi is now intensely investigated for application as an optical sensor for chemical substances.
多孔硅纳米结构Bragg光栅波导刻蚀参数的物理效应
制备了基于多孔硅(PSi)的多层布拉格光栅波导(BGW),并对其进行了表征。BGW直接蚀刻在基于psi的平面波导上。通过对电化学过程参数的调整,可以实现PSi的多层性能。制备的BGW结构取决于多孔结构的厚度和层数,以及平均孔径大小。前人的研究表明,电解液的HF浓度、蚀刻时间和电化学蚀刻过程中施加的电流密度对多层PSi的调制有很大的影响。表面均匀性和层均匀性也是研究的范围,两者都很大程度上依赖于这些因素。测定了多层结构的平均折射率、n和孔径,并对研究结果进行了比较。在PSi上制备的BGW作为化学物质光学传感器的应用正受到广泛的研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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