{"title":"BiCMOS h/sub fe/ degradation: causes and circuit solution","authors":"C. McAndrew, I. Kizilyalli, J. Bude","doi":"10.1109/BIPOL.1994.587893","DOIUrl":null,"url":null,"abstract":"h/sub fe/ degradation decreases BiCMOS speed and reliability. This paper presents the physical mechanisms of h/sub fe/ degradation, and a new, simple circuit technique that increases BiCMOS reliability and allows BiCMOS technologies to have lower breakdown voltages.","PeriodicalId":373721,"journal":{"name":"Proceedings of IEEE Bipolar/BiCMOS Circuits and Technology Meeting","volume":"103 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of IEEE Bipolar/BiCMOS Circuits and Technology Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BIPOL.1994.587893","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
h/sub fe/ degradation decreases BiCMOS speed and reliability. This paper presents the physical mechanisms of h/sub fe/ degradation, and a new, simple circuit technique that increases BiCMOS reliability and allows BiCMOS technologies to have lower breakdown voltages.