H. Shim, Yoohwan Kim, J. Jeon, Y. Cho, Jongwoo Park, S. Pae, Haebum Lee
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引用次数: 0
Abstract
As technology scales down, PMOS NBTI-induced mismatch, in addition to the NBTI mean-shifts and time0-Vt variation, is critical for designing circuitry having matched pair transistors, such as OP amplifier. This paper covers mismatch aging models incorporated into design simulation tool for PMIC products and used the Monte-Carlo simulation to consider process and systematic variations for robust design. Circuit simulation for PMIC OP Amp and its output characteristics were investigated and then further validated through the post-silicon HTOL stress. The pre-silicon simulation further enables to optimize HTOL stress conditions.