Process variations and their impact on circuit operation

S. Natarajan, M. Breuer, S. Gupta
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引用次数: 72

Abstract

The statistical variations in electrical parameters, such as transistor gain factors and interconnect resistances, due to variations in the manufacturing process are studied using data obtained from a 0.8 /spl mu/m CMOS process. The impact of these variations and correlations on circuit operation is illustrated. Examples show that circuit delay can increase from the mean by about 100% due to crosstalk effects aggravated by process variations. Case studies emphasize the need for a tighter coupling between fabrication and circuit design and the need for new design corners based on process information.
工艺变化及其对电路运行的影响
利用从0.8 /spl mu/m CMOS工艺中获得的数据,研究了由于制造工艺变化而导致的电参数(如晶体管增益因子和互连电阻)的统计变化。说明了这些变化和相关性对电路运行的影响。实例表明,由于工艺变化加剧了串扰效应,电路延迟可以比平均值增加约100%。案例研究强调了制造和电路设计之间需要更紧密的耦合,以及基于工艺信息的新设计角的需要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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