A study on optimization of process parameters, microstructure evolution and fracture behavior for full Cu3Sn solder joints in electronic packaging

P. Yao, Xiaoyan Li, X. Liang, Bo Yu
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引用次数: 1

Abstract

For understanding full IMCs solder joints comprehensively, the widely used Cu-Sn system was adopted as the research object. A study on optimization of process parameters, microstructure evolution and fracture behavior for full Cu3Sn solder joints in electronic packaging was conducted systematically. For forming full Cu3Sn solder joints, 260°C, 1N, 5h was determined as the optimal parameter combination. At 260°C and 1N, planar Cu6Sn5 was first precipitated at Cu-Sn interface, which was followed by the formation of planar Cu3Sn. Until the total consumption of residual Sn, the Cu6Sn5 continued to grow with a transition from the planar shape to scallop-like shape, while the Cu3Sn continued to grow with a round-trip change from the planar shape to wave-like shape. After the formation of full IMCs solder joints including Cu3Sn and Cu6Sn5, the Cu3Sn continued to grow at the expense of Cu6Sn5 until full Cu3Sn solder joints were obtained by 300min. When the loading rate was 0.001mm/s, 0.01mm/s and 0.1mm/s respectively, the shear strength of full Cu3Sn solder joints was 46.1MPa, 50MPa and 60.5MPa correspondingly. Through analysis of fracture surface, we found that different microscopic fracture mechanisms led to different strength of full Cu3Sn solder joints when the loading rate was varied.
电子封装全Cu3Sn焊点工艺参数优化、显微组织演变及断裂行为研究
为了全面了解全IMCs焊点,采用广泛使用的Cu-Sn体系作为研究对象。对电子封装用全Cu3Sn焊点的工艺参数优化、显微组织演变及断裂行为进行了系统的研究。对于形成全Cu3Sn焊点,确定260℃,1N, 5h为最佳参数组合。在260℃和1N下,Cu-Sn界面处首先析出平面Cu6Sn5,然后形成平面Cu3Sn。直到残余Sn的总消耗,Cu6Sn5继续生长,从平面形状过渡到扇形形状,而Cu3Sn继续生长,从平面形状到波状形状的往返变化。在形成含Cu3Sn和Cu6Sn5的全IMCs焊点后,Cu3Sn继续生长,以牺牲Cu6Sn5为代价,直到300min获得全Cu3Sn焊点。加载速率分别为0.001mm/s、0.01mm/s和0.1mm/s时,全Cu3Sn焊点的抗剪强度分别为46.1MPa、50MPa和60.5MPa。通过断口形貌分析,发现不同加载速率下,不同的显微断裂机制导致全Cu3Sn焊点强度不同。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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