In-plane and out-of-plane dielectric constant measurement techniques for sub-micron MOS devices

Chua Chee Tee, G. Sarkar, S.C.Y. Meng, D. Yu, L. Chan
{"title":"In-plane and out-of-plane dielectric constant measurement techniques for sub-micron MOS devices","authors":"Chua Chee Tee, G. Sarkar, S.C.Y. Meng, D. Yu, L. Chan","doi":"10.1109/HKEDM.1997.642338","DOIUrl":null,"url":null,"abstract":"This paper focuses on the techniques adopted to carefully characterize the dielectric constant of low k SOG (spin-on-glass), both for in-plane and out-of-plane measurements. In the case of out-of-plane dielectric constant measurement, the capacitance-voltage (C-V) sweep is utilised to measure the SOG capacitance. For in-plane dielectric constant measurement, intra capacitors are required and a novel technique of extracting coupling capacitance is presented.","PeriodicalId":262767,"journal":{"name":"1997 IEEE Hong Kong Proceedings Electron Devices Meeting","volume":"89 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-08-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 IEEE Hong Kong Proceedings Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/HKEDM.1997.642338","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

This paper focuses on the techniques adopted to carefully characterize the dielectric constant of low k SOG (spin-on-glass), both for in-plane and out-of-plane measurements. In the case of out-of-plane dielectric constant measurement, the capacitance-voltage (C-V) sweep is utilised to measure the SOG capacitance. For in-plane dielectric constant measurement, intra capacitors are required and a novel technique of extracting coupling capacitance is presented.
亚微米MOS器件的面内和面外介电常数测量技术
本文重点介绍了用于面内和面外测量的低k SOG(玻璃上自旋)介电常数的仔细表征技术。在面外介电常数测量的情况下,使用电容-电压(C-V)扫描来测量SOG电容。平面内介电常数测量需要内置电容,提出了一种提取耦合电容的新方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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