Breakthrough of on-resistance Si limit by Super 3D MOSFET under 100V breakdown voltage

Abstract

Under 100V breakdown voltage, a new device structure is required for the purpose of reducing on-resistance and for high reliability. In this study, it was demonstrated that the Si limit of on-resistance was broken by super 3D MOSFET structure that we had already proposed in an actual prototype fabrication. Its on-resistance was 16.4mOmegamiddotmm2 at the breakdown voltage of 58V. Moreover, it was clarified that the UIS (undamped inductive switching) endurance of this device was 3.08 J/cm2 with 3 mm times 3 mm size chip and this result is 1.5 times stronger than that of conventional structure. This super 3D structure was fabricated by unique simplified trench filling epitaxial process and high aspect ratio trench etching process. The super 3D MOSFET is very attractive for automotive motor drive use