Analysis of the influence of interface charges on the electrical characteristics of GaAs/GaN junctions

S. Yamajo, J. Liang, N. Shigekawa
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引用次数: 1

Abstract

Electrical properties of p+-GaAs/n-GaN and n+-GaAs/n-GaN, heterojunctions fabricated by using surface-activated bonding (SAB) are investigated. The measured C-V characteristics of p+-GaAs/n-GaN and n+-GaAs/n-GaN junctions are in quantitative agreement with modeled ones obtained for the interface states density and the conduction-band discontinuity of 1.5×1014 cm−2 eV−1 and 0.63 eV, respectively.
界面电荷对GaAs/GaN结电特性的影响分析
研究了表面活化键合制备的p+-GaAs/n- gan和n+-GaAs/n- gan异质结的电学性能。测得的p+-GaAs/n- gan和n+-GaAs/n- gan结的C-V特性与模拟得到的界面态密度和导带不连续度分别为1.5×1014 cm−2 eV−1和0.63 eV的C-V特性定量一致。
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