Optical simulations for fractional fluorine terminated coatings on nanoimprint lithography masks

T. Seidel, A. Goldberg, M. Halls
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Abstract

Simulations of the optical intensity within Nano Imprint Lithography (NIL) mask features have been made for patterned quartz masks having ultrathin film coatings with different indices of refraction. Fractionally fluorine terminated surfaces, previously proposed for improving the yield of NIL processes, are briefly reviewed. Optical intensity solutions within the feature were obtained using Panoramictech Maxwell solver software for variances in the optical constants of the coating films, aspect ratio, feature size, and wavelength.. The coated masks have conformal surface, higher index of refraction under-layer coating and a fractional terminated fluorine hydrocarbon (FHC) monomolecular layer. The values of optical constants for the FHC layers are unknown, so a range of ad-hoc values were simulated. Optical constants for quartz mask and Al2O3, TiO2 and Si under-layer films are taken from the literature. Wavelengths were varied from 193nm to 365nm. The question of photo-dissociation of the FHC layer for higher energy photons is addressed from first principles, with the result that the F-terminated layers are stable at higher wavelengths. Preliminary simulations for features filled with resist over various substrates are dependent on the antireflection character of the underlying film system. The optical intensity is generally increased within the simulated mask feature when coated with a higher index/FHC films relative to the uncoated reference quartz mask for ~5nm physical feature sizes.
纳米压印掩模上分数氟端部涂层的光学模拟
本文对具有不同折射率的超薄膜涂层的石英掩模进行了光强模拟。本文简要回顾了先前提出的用于提高零氮化工艺收率的部分氟端表面。利用Panoramictech Maxwell求解软件获得了特征内的光强解,其中包括涂层光学常数、长宽比、特征尺寸和波长的变化。涂层掩模具有保形表面、较高折射率的底层涂层和端部氟烃(FHC)单分子层。由于FHC层的光学常数是未知的,所以模拟了一系列的自定义值。石英掩膜和Al2O3、TiO2和Si薄膜的光学常数取自文献。波长从193nm到365nm不等。从第一性原理出发,讨论了FHC层在高能量光子下的光解离问题,结果表明f端层在更高波长下是稳定的。在各种衬底上填充抗蚀剂的特征的初步模拟取决于底层薄膜系统的抗反射特性。在~5nm的物理特征尺寸上,相对于未涂覆的参考石英掩模,涂覆更高的折射率/FHC薄膜时,模拟掩模特征内的光学强度通常会增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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