Injection control technique for high speed switching with a double gate PNM-IGBT

M. Sumitomo, H. Sakane, K. Arakawa, Y. Higuchi, M. Matsui
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引用次数: 42

Abstract

We proposed a PNM-IGBT [1] that can realize performance close to the theoretical limit shown by Nakagawa, et, al [2, 3]. In that work, we confirmed PNM-IGBT can achieve a very low saturation voltage due to its great injection enhancement effect. However, it is accompanied by a slight increase in turn-off-loss. We believe that we can diminish this increase by our unique control technique. Therefore, in this paper, we propose a fundamentally new IGBT control technique. By combining this control technique and PNM-IGBT, it becomes possible to achieve both a low saturation voltage and fast switching speed. To demonstrate the above hypothesis, we have developed a double gate PNM-IGBT, and confirmed a decrease in turn-off-loss of 30% using this technique.
双栅PNM-IGBT高速开关的注入控制技术
我们提出了一种PNM-IGBT[1],可以实现接近Nakagawa等人[2,3]的理论极限的性能。在这项工作中,我们证实了PNM-IGBT由于其强大的注入增强效果可以实现非常低的饱和电压。然而,它伴随着关闭损失的轻微增加。我们相信我们可以通过我们独特的控制技术来减少这种增长。因此,本文提出了一种全新的IGBT控制技术。通过将该控制技术与PNM-IGBT相结合,可以实现低饱和电压和快速开关速度。为了证明上述假设,我们开发了一种双栅极PNM-IGBT,并证实使用这种技术可以减少30%的关断损耗。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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