A Phosphine Sub Atmospheric Delivery System (SADS) Applied to Low Pressure Chemical Vapor Deposition (LPCVD) of In-Situ Doped Polysilicon

Abstract

A phosphine SADS has been fitted to a conventional LPCVD furnace system. Through careful design and implementation, we have demonstrated an inherently safe system with significantly lower infrastructure requirements and costs that meet all semiconductor industry safety requirements.