A low-temperature temporary lamination and laser debonding technology to enable cost-effective fabrication of a through-glass-via (TGV) interposer on a panel substrate
Alvin Lee, Jay Su, Baron Huang, Dongshun Bai, Wen-Wei Shen, Hsiang-Hung Chang, C. Chiang
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引用次数: 1
Abstract
This paper describes a handling process for a thin glass panel, 200 mm × 200 mm × 130 (im, through double-side redistribution layer (RDL) formation to enable cost-effective fabrication of through-glass-via (TGV) interposers. The integration scheme includes lamination of a low-temperature bonding material utilizing a lamination process temperature of less than 100°C to bond a thin (130-μm) glass panel onto a carrier glass panel 700 μm thick. The carrier glass panel is treated with a 150-nm laser release layer prior to lamination of the bonding film and subsequently the thin glass panel. Next, the RDL is formed, and the front side of the thin glass panel undergoes aluminum physical vapor deposition (PVD) and polymeric dielectric material deposition. Then a second carrier glass panel, treated with the laser release material and laminated with bonding film, is bonded on the front side of the thin glass panel. An excimer laser with an x-y scanning stage is rastered across the first carrier to ablate the laser release layer for separation of first carrier. Following laser separation, a solvent cleaning step is performed to remove bonding material from the backside of the thin glass panel. The process of applying metal PVD, lithography, and dielectric material is repeated on the backside of the thin glass panel. Finally, the thin glass panel is mounted to tape, and the second carrier glass panel is released using laser ablation to reveal the front side of the thin glass for solvent cleaning and final inspection. The integration of the dry bonding film, thin glass panel lamination, and selective laser debonding technology in this study will pave the way for realization of panel-level packaging in the near future.
本文描述了通过双面再分布层(RDL)形成200 mm × 200 mm × 130 (im)的薄玻璃板的处理工艺,以实现具有成本效益的通过玻璃通孔(TGV)中间层的制造。集成方案包括利用层压工艺温度低于100°C的低温粘合材料层压,将薄(130 μm)玻璃面板粘合到700 μm厚的载体玻璃面板上。载体玻璃面板在粘合膜层压之前和随后的薄玻璃面板之前用150nm激光释放层处理。接下来,形成RDL,薄玻璃板的正面经历铝物理气相沉积(PVD)和聚合物介电材料沉积。然后在薄玻璃板的正面粘接用激光释放材料处理过的第二载体玻璃板,并用粘接膜层压。具有x-y扫描级的准分子激光器光栅穿过第一载流子以烧蚀激光释放层以分离第一载流子。在激光分离之后,进行溶剂清洗步骤以从薄玻璃板的背面去除粘合材料。在薄玻璃板的背面重复应用金属PVD、光刻和介电材料的过程。最后,将薄玻璃面板安装在胶带上,使用激光烧蚀释放第二载体玻璃面板,露出薄玻璃的正面,进行溶剂清洗和最终检查。本研究将干键合膜、薄玻璃板贴合和选择性激光脱粘技术相结合,将为在不久的将来实现面板级封装铺平道路。