Influences of pad shape and solder microstructure on shear force of low cost flip chip bumps

Jian Cai, S. Law, A. Teng, P. Chan
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引用次数: 9

Abstract

The bumping process plays a critical role in flip chip technology. A low cost bumping process has been developed using electroless nickel and immersion gold followed by stencil printing. The process flow is described in this paper. The Al pad size is about 100 /spl mu/m in diameter with a pitch of 400 /spl mu/m. Different electroless plating solutions were evaluated and different solder pastes were used to evaluate the stencil printing process. Different pad shapes were also tested for shear strength. Ni studs with no bump material were fabricated to evaluate the electroless process. The shear force test result shows a strength value of 230 MPa for Ni studs. The solder bump after reflow has a diameter of 160 /spl mu/m and a height of 120 /spl mu/m. There is some difference in the shear force test results for different pad shapes. SEM and EDAX results of the fracture surface indicate that the fracture was cohesive or inside the solder. Cross sections showed some intermetallic layers at the interface. A Ni-Sn intermetallic layer and a phosphorus rich layer formed during reflow, which have compositions of Ni/sub 3/Sn/sub 4/ and Ni/sub 3/P respectively. The low cost flip chip samples were subjected to multiple reflows and shear force tests were performed. Fracture surfaces were analysed and failure modes were differentiated.
焊盘形状和焊料微观结构对低成本倒装芯片凸点剪切力的影响
碰撞过程在倒装芯片技术中起着关键作用。采用化学镀镍和浸没金进行模板印刷,开发了一种低成本的冲压工艺。本文描述了该工艺流程。铝垫直径约100 /亩,节距约400 /亩。对不同的化学镀溶液进行了评价,并使用不同的锡膏对模板印刷工艺进行了评价。不同形状的垫块也进行了抗剪强度测试。制备了无凹凸材料的镍螺柱,对化学镀工艺进行评价。剪切力试验结果表明,Ni螺柱的强度值为230 MPa。回流后的凸点直径160 /spl mu/m,高度120 /spl mu/m。不同垫块形状的剪力试验结果存在一定的差异。断口形貌的SEM和EDAX分析结果表明,断口是内聚的或在焊料内部。截面显示界面处有金属间层。回流过程中形成镍锡金属间层和富磷层,其组成分别为Ni/sub 3/Sn/sub 4/和Ni/sub 3/P。对低成本倒装芯片样品进行了多次回流和剪切力测试。对断裂表面进行了分析,并对断裂模式进行了区分。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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