Low-aberration ExB deflector optics for scanning electron microscopy.

Momoyo Enyama, Ryuji Nishi, Hiroyuki Ito, Jun Yamasaki
{"title":"Low-aberration ExB deflector optics for scanning electron microscopy.","authors":"Momoyo Enyama,&nbsp;Ryuji Nishi,&nbsp;Hiroyuki Ito,&nbsp;Jun Yamasaki","doi":"10.1093/jmicro/dfad001","DOIUrl":null,"url":null,"abstract":"<p><p>To suppress aberrations in the signal electron optics of a scanning electron microscope, we propose ExB deflector (deflector with superimposed electric and magnetic fields) optics that cancel the aberrations generated during large-angle deflection. This improves the resolution of the angle or position of the signal electrons on the sample surface, allowing them to be discriminately detected. The proposed optics consist of two ExB deflectors and a transfer system with two 4-f systems, or systems that have four times the focal length, placed between them. This configuration maintains the symmetry of the electron beam trajectory throughout the transfer system such that aberrations generated by the first ExB deflector are negated by the second. The effect of the proposed optics was confirmed using a ray-tracing simulation of the electron beam, and the aberration was reduced to at most one-tenth of that in the case with only one ExB deflector. Furthermore, as an example, we examined the implementation of the proposed ExB deflector optics to resolve the signal electron angle and found that the sample emission angle range of 80° can be resolved with an angular resolution of 1°. Therefore, the proposed ExB deflector optics can be applied to the signal electron optics of a scanning electron microscope to improve the resolution of the signal electrons.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"399-407"},"PeriodicalIF":0.0000,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microscopy (Oxford, England)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1093/jmicro/dfad001","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

To suppress aberrations in the signal electron optics of a scanning electron microscope, we propose ExB deflector (deflector with superimposed electric and magnetic fields) optics that cancel the aberrations generated during large-angle deflection. This improves the resolution of the angle or position of the signal electrons on the sample surface, allowing them to be discriminately detected. The proposed optics consist of two ExB deflectors and a transfer system with two 4-f systems, or systems that have four times the focal length, placed between them. This configuration maintains the symmetry of the electron beam trajectory throughout the transfer system such that aberrations generated by the first ExB deflector are negated by the second. The effect of the proposed optics was confirmed using a ray-tracing simulation of the electron beam, and the aberration was reduced to at most one-tenth of that in the case with only one ExB deflector. Furthermore, as an example, we examined the implementation of the proposed ExB deflector optics to resolve the signal electron angle and found that the sample emission angle range of 80° can be resolved with an angular resolution of 1°. Therefore, the proposed ExB deflector optics can be applied to the signal electron optics of a scanning electron microscope to improve the resolution of the signal electrons.

用于扫描电子显微镜的低像差ExB偏转器光学器件。
为了抑制扫描电子显微镜信号电子光学系统中的像差,我们提出了ExB偏转器(具有叠加电场和磁场的偏转器)光学系统,该系统可以消除大角度偏转过程中产生的像差。这提高了信号电子在样品表面上的角度或位置的分辨率,使它们能够被有区别地检测到。所提出的光学器件由两个ExB偏转器和一个传输系统组成,传输系统之间有两个4-f系统,或焦距为四倍的系统。这种配置在整个传输系统中保持电子束轨迹的对称性,使得由第一ExB偏转器产生的像差被第二ExB偏振器抵消。使用电子束的光线跟踪模拟证实了所提出的光学器件的效果,并且像差最多减少到只有一个ExB偏转器的情况下的十分之一。此外,作为一个例子,我们检查了所提出的ExB偏转器光学器件的实现,以解析信号电子角,并发现可以用1°的角分辨率解析80°的样品发射角范围。因此,所提出的ExB偏转器光学器件可以应用于扫描电子显微镜的信号电子光学器件,以提高信号电子的分辨率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信