2019 19th International Workshop on Junction Technology (IWJT)

查看最新文献

559

2019 19th International Workshop on Junction Technology (IWJT) - 最新文献

Fabrication of epitaxial tunnel junction on tunnel field effect transistors

Pub Date : 2019-06-06 DOI: 10.23919/IWJT.2019.8802892 Y. Morita, K. Fukuda, T. Mori, T. Matsukawa

Normally-Off Sputtered-MoS2 nMISFETs with MoSi2 Contact by Sulfur Powder Annealing and ALD Al2O3 Gate Dielectric for Chip Level Integration

Pub Date : 2019-06-06 DOI: 10.23919/IWJT.2019.8802622 K. Matsuura, M. Hamada, T. Hamada, H. Tanigawa, T. Sakamoto, W. Cao, K. Parto, A. Hori, I. Muneta, T. Kawanago, K. Kakushima, K. Tsutsui, A. Ogura, K. Banerjee, H. Wakabayashi

Review of applications of Defect Photoluminescence Imaging (DPLI) during IC processing

Pub Date : 2019-06-06 DOI: 10.23919/IWJT.2019.8802893 L. Jastrzebski, R. Duru, D. Le-Cunff, M. Cannac, S. Joblot, I. Mica, M. Polignano, A. Galbiati, P. Monge, Roffarello, G. Nadudvari, Z. Kiss, I. Lajtos, A. Pongrácz, G. Molnár, M. Nagy, L. Dudás, P. Basa, B. Greenwood, J. Gambino

查看全部

免责声明：
本页显示期刊或杂志信息，仅供参考学习，不是任何期刊杂志官网，不涉及出版事务，特此申明。如需出版一切事务需要用户自己向出版商联系核实。若本页展示内容有任何问题，请联系我们，邮箱：info@booksci.cn，我们会认真核实处理。